The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 06, 1998

Filed:

Nov. 21, 1997
Applicant:
Inventors:

Naoki Shindo, Nirasaki, JP;

Shigenori Kitahara, Kikuchi-gun, JP;

Takayuki Toshima, Nirasaki, JP;

Kenji Yokomizo, Austin, TX (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B08B / ;
U.S. Cl.
CPC ...
134 254 ; 134 15 ; 134 26 ; 134 66 ; 134 32 ; 134 82 ; 134902 ; 414222 ;
Abstract

A method of washing substrates arranged at a substantially equal pitch internal in a cassette which includes steps of (a) transferring the substrates to a holder a pitch interval narrower than the arrangement pitch interval in said cassette; (b) supplying a washing solution into a processing bath; (c) conveying the holder holding the substrates into the processing bath; (d) dipping the substrates in the washing solution in the processing bath to wash the substrates; and (e) supplying a rinse solution into the processing bath to substitute the washing solution with the rinse solution to rinse the substrates in the processing bath.


Find Patent Forward Citations

Shindo, Naoki. (1998). Method for washing substrates (U.S. Patent No. 5817185). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5817185

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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