The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 06, 2012
Filed:
Dec. 10, 2009
Teruomi Minami, Koshi, JP;
Fumihiro Kamimura, Tosu, JP;
Kazuki Kosai, Beaverton, OR (US);
Takashi Yabuta, Tosu, JP;
Kenji Yokomizo, Austin, TX (US);
Shogo Mizota, Koshi, JP;
Teruomi Minami, Koshi, JP;
Fumihiro Kamimura, Tosu, JP;
Kazuki Kosai, Beaverton, OR (US);
Takashi Yabuta, Tosu, JP;
Kenji Yokomizo, Austin, TX (US);
Shogo Mizota, Koshi, JP;
Tokyo Electron Limited, Minato-Ku, JP;
Abstract
In a liquid processing apparatus configured to remove, from a substrate including a first film and a second film formed above the first film, the first film and the second film, a first chemical-liquid supply part supplies, to a substrate W, a first liquid for dissolving the first film, a second chemical-liquid supply part supplies a second chemical liquid for weakening the second film, and a fluid supply part serving also as an impact giving part gives a physical impact to the second film so as to break the second film and supplies a fluid for washing away debris of the broken second film. A control device controls the respective parts such that, after the second liquid has been supplied and then the fluid has been supplied from the fluid supply part, the first chemical liquid is supplied.