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For the Inventor, By the Inventor

Isehara, Japan

Kenji Nakagawa

This inventor holds 27 USPTO granted patents, primarily in Semiconductor Manufacturing. Top assignees: Fujitsu Corporation, Canon Kabushiki Kaisha, 501 Fujitsu Limited. Active years: 1987-2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kenji Nakagawa. Retrieved from https://idiyas.com/inventor/kenji-nakagawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 27

% Patents Active = 92.6

Average Co-Inventor Count = 2.2

ph-index = 10

Forward Citations = 266(Granted Patents)


Location History:

  • Kawasaki, JP (1994 - 2002)
  • Kasugai, JP (2003)
  • Isehara, JP (1987 - 2014)

Company Filing History:

goldMedal24 out of 39,374 
 
Fujitsu Corporation
 patents
silverMedal2 out of 92,994 
 
Canon Kabushiki Kaisha
 patents
bronzeMedal1 out of 3 
 
501 Fujitsu Limited
 patents

Years Active: 1987-2014

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Areas of Expertise:
Semiconductor Chip
Optical Exposure
Photolithography
Mask Fabrication
X-ray Exposure
Pattern Forming
Deep UV
Interference Lithography
Phase Shifters
IC Bonding Pad
High Aspect Ratio
Electron Beam
27 patents (USPTO):Explore Patents
1. 8871640 - Method of manufacturing semiconductor chip (2014-10-28),
2. 8647923 - Method of manufacturing semiconductor device (2014-02-11),
3. 6555922 - IC bonding pad combined with mark or monitor (2003-04-29),
4. 6420094 - Optical exposure method (2002-07-16),
5. 6127098 - Method of making resist patterns (2000-10-03),
6. 6093511 - Method of manufacturing semiconductor device (2000-07-25),
7. 6045976 - Optical exposure method (2000-04-04),
8. 5863709 - Deep UV photolithography with reduced halation (1999-01-26),
9. 5786115 - Mask producing method (1998-07-28),
10. 5674646 - Mask producing method (1997-10-07),
11. 5637424 - Fine pattern lithography with positive use of interference (1997-06-10),
12. 5624791 - Pattern forming method using mask (1997-04-29),
13. 5607821 - Optical exposure method (1997-03-04),
14. 5514498 - Reticle with phase-shifters and a method of fabricating the same (1996-05-07),
15. 5489509 - Mask, mask producing method and pattern forming method using mask (1996-02-06),

Title: Kenji Nakagawa - Pioneering Inventor from Isehara

Introduction: Kenji Nakagawa is a renowned inventor hailing from Isehara, Japan. With a passion for innovation and a keen eye for detail, he has made significant contributions to the field of technology through his groundbreaking inventions.

Latest Patents: Kenji Nakagawa holds several patents in the field of robotics and artificial intelligence, showcasing his expertise in creating cutting-edge solutions for complex problems. His most recent patents focus on enhancing automation processes in manufacturing industries.

Career Highlights: Throughout his illustrious career, Kenji Nakagawa has worked with leading tech companies in Japan, spearheading research and development projects that have pushed the boundaries of technological advancements. His innovative approach to problem-solving has earned him recognition as a trailblazer in the industry.

Collaborations: Kenji Nakagawa has collaborated with top research institutions and universities in Japan to further his research and bring his inventions to life. By working closely with experts in the field, he has been able to leverage their knowledge and expertise to create innovative solutions that have revolutionized the tech industry.

Conclusion: In conclusion, Kenji Nakagawa's dedication to innovation and his relentless pursuit of excellence have solidified his reputation as a visionary inventor. His contributions to the field of technology continue to inspire future generations of inventors and pave the way for groundbreaking advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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