The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 06, 1996
Filed:
Apr. 30, 1993
Applicant:
Inventors:
Toshiaki Kawabata, Kawasaki, JP;
Kenji Nakagawa, Isehara, JP;
Seiichiro Yamaguchi, Tempe, AZ (US);
Masao Taguchi, Sagamihara, JP;
Kazuhiko Sumi, Kawasaki, JP;
Yuichiro Yanagishita, Kawasaki, JP;
Assignee:
Fujitsu, Ltd., Kawasaki, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430-5 ; 430 22 ; 430269 ; 430311 ; 430396 ; 378 34 ; 378 35 ;
Abstract
A mask includes a first layer which is transparent with respect to an exposure light, and a phase shift mask pattern which is formed on the transparent layer. The pattern includes one or more phase shift regions adapted for transmitting the exposure light impinging thereon and shifting the phase of the transmitted light relative to the phase of light which passes through a portion of the mask having no phase shift layer.