Chikusei, Japan

Ken Nanaumi




Average Co-Inventor Count = 4.7

ph-index = 5

Forward Citations = 98(Granted Patents)


Location History:

  • Shimodate, JP (1980 - 2009)
  • Chikusei, JP (2011 - 2017)

Company Filing History:


Years Active: 1980-2017

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13 patents (USPTO):Explore Patents

Title: Ken Nanaumi: Innovator in Photosensitive Resin Technology

Introduction

Ken Nanaumi is a prominent inventor based in Chikusei, Japan. He has made significant contributions to the field of photosensitive resin technology, holding a total of 13 patents. His work focuses on developing advanced materials that enhance the performance of semiconductor devices and electronic applications.

Latest Patents

Among his latest patents, Nanaumi has developed a positive-type photosensitive resin composition that includes several key components. This composition features a phenol resin modified by a compound with an unsaturated hydrocarbon group, a light-sensitive acid-producing compound, a thermal crosslinking agent, and a solvent. The innovative resin can be developed using an alkaline aqueous solution, resulting in a resist pattern that exhibits high sensitivity, resolution, excellent adhesion, and good thermal shock resistance. Another notable patent involves a positive tone photosensitive composition that comprises an alkali-soluble resin with a phenolic hydroxyl group, a light-sensitive acid-producing compound, a thermal crosslinking agent, and an acrylic resin. This composition also allows for development with an aqueous alkali solution, providing a resist pattern with superior adhesiveness and thermal shock resistance.

Career Highlights

Ken Nanaumi is currently associated with Hitachi Chemical Company, Ltd., where he continues to innovate in the field of materials science. His work has been instrumental in advancing the capabilities of photosensitive resins, which are critical in the manufacturing of semiconductor devices.

Collaborations

Throughout his career, Nanaumi has collaborated with notable colleagues, including Hiroshi Matsutani and Takumi Ueno. These collaborations have further enriched his research and development efforts, leading to groundbreaking advancements in his field.

Conclusion

Ken Nanaumi's contributions to photosensitive resin technology have positioned him as a key figure in the industry. His innovative patents and ongoing work at Hitachi Chemical Company, Ltd. continue to influence the development of advanced materials for electronic devices.

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