Sanda, Japan

Keita Umemoto


 

Average Co-Inventor Count = 2.7

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2017-2021

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5 patents (USPTO):Explore Patents

Title: Keita Umemoto: Innovator in Sputtering Technology

Introduction

Keita Umemoto, an accomplished inventor based in Sanda, Japan, has made significant contributions to the field of sputtering technology. With five patents to his name, Umemoto's work focuses on developing advanced sputtering targets that enhance the efficiency and effectiveness of various applications in materials science.

Latest Patents

Among his latest innovations, Umemoto developed a sputtering target with a composition containing 45 at % to 90 at % of indium (In), complemented by copper (Cu) and inevitable impurities. This invention showcases a unique structure where both an In single phase and a CuIn compound phase coexist, characterized by a specific XRD peak ratio. Additionally, he introduced a Cu-Ga binary alloy sputtering target, notable for its excellent mechanical workability, high density, and robust bending strength. This target features a specifically calibrated composition, ensuring high performance in various applications.

Career Highlights

Throughout his career, Umemoto has been associated with prominent companies in the industry. His tenure at Mitsubishi Materials Corporation and Solar Frontier K.K. allowed him to refine his expertise and contribute significantly to research and development in sputtering technology. His innovations have positioned him as a key player in advancing manufacturing processes and materials efficiency.

Collaborations

In his quest for innovation, Umemoto has collaborated with talented individuals, including coworkers Shoubin Zhang and Masahiro Shoji. These partnerships have further propelled the development of technologies that enhance sputtering targets, contributing to the broader research community.

Conclusion

Keita Umemoto stands out as a visionary in the realm of sputtering technology. His ability to develop high-quality sputtering targets stems from a deep understanding of materials science and engineering. As he continues to innovate, his work not only strengthens the technological foundations of various industries but also paves the way for future advancements in sputtering applications.

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