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For the Inventor, By the Inventor

Utsunomiya, Japan

Keita Sakai

USPTO Granted Patents = 15


Average Co-Inventor Count = 2.0

ph-index = 6

Forward Citations = 71(Granted Patents)


Location History:

  • Tochigi, JP (2010)
  • Utsunomiya, JP (1999 - 2023)

Company Filing History:

goldMedal15 out of 90,594 
 
Canon Kabushiki Kaisha
 patents

Years Active: 1999-2023

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15 patents (USPTO):
1. 11752686 - Imprint apparatus and method of controlling imprint apparatus (2023-09-12),
2. 11267252 - Ejection apparatus and imprint apparatus (2022-03-08),
3. 9829789 - Method for determining pattern of mold for imprint, imprint method, and apparatus (2017-11-28),
4. 9164395 - Exposure apparatus, and method of manufacturing a device (2015-10-20),
5. 7754011 - Method of manufacturing a calcium fluoride single crystal (2010-07-13),
6. 7714980 - Exposure apparatus, exposure method, and exposure system (2010-05-11),
7. 7705966 - Immersion exposure apparatus (2010-04-27),
8. 7394522 - Exposure apparatus and device manufacturing method (2008-07-01),
9. 7105049 - Method of manufacturing single crystal calcium fluoride (2006-09-12),
10. 6479212 - Photosensitive resin, resist composition using the photosensitive resin, pattern formation method using the resist composition, device produced by the pattern formation method, and exposure method (2002-11-12),
11. 6331383 - Patterning method, and method for manufacturing semiconductor device (2001-12-18),
12. 6225019 - Photosensitive resin, resist based on the photosensitive resin, exposure apparatus and exposure method using the resist, and semiconductor device obtained by the exposure method (2001-05-01),
13. 6087076 - Method of manufacturing semiconductor devices by performing coating, (2000-07-11),
14. 6008942 - Diffractive optical element and optical instrument having the same (1999-12-28),
15. 5952149 - Resist solution for photolithography including a base resin and an (1999-09-14),

Title: Keita Sakai: Innovator in Imprint Technology

Introduction

Keita Sakai is a prominent inventor based in Utsunomiya, Japan. He has made significant contributions to the field of imprint technology, holding a total of 15 patents. His work focuses on developing advanced apparatuses that enhance the efficiency and precision of imprinting processes.

Latest Patents

Sakai's latest patents include innovative designs for imprint and ejection apparatuses. One of his notable inventions is an imprint apparatus that features a movable housing unit, an ejection head for dispensing ejection material, and a flexible member that separates the housing into two storing spaces. This design incorporates a pressure control unit that manages the pressure in the second storing space and a bubble detection unit to identify bubbles in the channels. Another significant patent is for an ejection apparatus that maintains a negative pressure within a storage container, ensuring optimal conditions for ejecting materials in a liquid state.

Career Highlights

Keita Sakai is currently employed at Canon Kabushiki Kaisha, where he continues to push the boundaries of technology in his field. His work has not only advanced the capabilities of imprint technology but has also contributed to the overall innovation landscape within the company.

Collaborations

Sakai collaborates with talented colleagues, including Hiroshi Maehara and Noriyasu Hasegawa. Their combined expertise fosters a creative environment that drives the development of cutting-edge technologies.

Conclusion

Keita Sakai's contributions to imprint technology exemplify the spirit of innovation. His patents reflect a commitment to enhancing the efficiency and effectiveness of imprinting processes. Through his work at Canon, he continues to inspire advancements in the field.

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