The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 01, 2008
Filed:
May. 30, 2007
Noriyasu Hasegawa, Utsunomiya, JP;
Tomofumi Nishikawara, Kawachi-gun, JP;
Keita Sakai, Utsunomiya, JP;
Noriyasu Hasegawa, Utsunomiya, JP;
Tomofumi Nishikawara, Kawachi-gun, JP;
Keita Sakai, Utsunomiya, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
At least one exemplary embodiment is directed to an exposure apparatus for exposing a substrate. The exposure apparatus includes a movable substrate stage, a projection optical system configured to project light from an original and including a final optical element, and a nozzle member provided around the final optical element and including an opposing surface opposing the substrate. The substrate is exposed via liquid filled between a final surface of the projection optical system and the substrate, the projection optical system, and the original. The opposing surface includes a supply port, a first recovery port provided farther from an optical axis of the final optical element than the supply port, and a first portion and a second portion provided between the supply port and the first recovery port. The distance between the first portion and the substrate is longer than the distance between the supply port and the substrate.