The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 01, 2001
Filed:
Feb. 04, 1999
Applicant:
Inventors:
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/004 ; C08G 7/520 ; C08F / ;
U.S. Cl.
CPC ...
G03F 7/004 ; C08G 7/520 ; C08F / ;
Abstract
Provided is a photosensitive resin with high sensitivity to exposure light. The photosensitive resin comprises a vinyl monomer moiety having an alicyclic group in a side chain thereof, and a sulfonyl moiety.
Matsuda, Minoru. (2001). Photosensitive resin, resist based on the photosensitive resin, exposure apparatus and exposure method using the resist, and semiconductor device obtained by the exposure method (U.S. Patent No. 6225019). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6225019
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile