The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 12, 2002
Filed:
Aug. 01, 2000
Applicant:
Inventors:
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C03F 7/004 ; C08G 7/520 ; C08F / ;
U.S. Cl.
CPC ...
C03F 7/004 ; C08G 7/520 ; C08F / ;
Abstract
There is provided a photosensitive resin having at least three moieties in the backbone chain, two moieties of which moieties are an alicyclic group moiety and a sulfonyl moiety. The photosensitive resin has a superior solubility in solvents and a superior dry-etching resistance, and enables easy fabrication of highly integrated semiconductor devices.
Matsuda, Minoru. (2002). Photosensitive resin, resist composition using the photosensitive resin, pattern formation method using the resist composition, device produced by the pattern formation method, and exposure method (U.S. Patent No. 6479212). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6479212
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile