Tokyo, Japan

Keisuke Takeda

USPTO Granted Patents = 4 

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2024-2025

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4 patents (USPTO):Explore Patents

Title: Keisuke Takeda: Innovator in Thin-Film Technology

Introduction

Keisuke Takeda is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of thin-film technology, holding a total of 4 patents. His work focuses on the development of advanced materials that are essential for various applications in electronics and materials science.

Latest Patents

Takeda's latest patents include innovative compounds and methods for producing thin films. One of his notable inventions is a cobalt compound that serves as a thin-film forming raw material. This cobalt compound is represented by a specific general formula, where various groups can be substituted to enhance its properties. Another significant patent involves an amidinate compound and its dimer, which are also used as raw materials for thin-film production. These inventions highlight his expertise in creating materials that are crucial for modern technological applications.

Career Highlights

Keisuke Takeda is currently employed at Adeka Corporation, a leading company in the field of chemical manufacturing. His role at Adeka allows him to further his research and development efforts in thin-film technologies. His contributions have not only advanced the company's portfolio but have also positioned him as a key figure in the industry.

Collaborations

Throughout his career, Takeda has collaborated with notable colleagues, including Atsushi Yamashita and Tomoharu Yoshino. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas, leading to groundbreaking advancements in their respective fields.

Conclusion

Keisuke Takeda's work in thin-film technology exemplifies the impact of innovative thinking in the field of materials science. His patents and contributions continue to influence the development of advanced materials, showcasing his dedication to innovation and excellence.

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