Toyama, Japan

Keiichi Murayama

USPTO Granted Patents = 16 

Average Co-Inventor Count = 3.4

ph-index = 4

Forward Citations = 54(Granted Patents)


Location History:

  • Osaka, JP (2004)
  • Okayama, JP (2005 - 2007)
  • Toyama, JP (2006 - 2024)

Company Filing History:


Years Active: 2004-2025

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16 patents (USPTO):Explore Patents

Title: The Innovative Mind of Keiichi Murayama

Introduction

Keiichi Murayama, an accomplished inventor based in Toyama, Japan, has made significant contributions to the field of semiconductor technology. With a remarkable portfolio of 15 patents, he has shown a continued commitment to innovation and excellence in his career.

Latest Patents

Among his latest patents, Keiichi Murayama has developed a comprehensive manufacturing method for semiconductor devices. This method emphasizes the formation of grooves within a semiconductor layer, where specific oxide films are meticulously laid to enhance the semiconductor's efficiency. Additionally, he has designed a semiconductor device that integrates the trade-off characteristics of both Heterojunction Bipolar Transistors (HBT) and High Electron Mobility Transistors (HFET). This integrated circuit showcases layers of materials such as GaAs and InGaP, highlighting his expertise in optimizing semiconductor performance.

Career Highlights

Keiichi Murayama's illustrious career includes valuable experiences at reputable organizations, such as Matsushita Electric Industrial Co., Ltd. and Panasonic Corporation. His work at these companies has allowed him to refine his skills and contribute to groundbreaking advancements in semiconductor technologies.

Collaborations

Throughout his career, Murayama has collaborated with notable peers like Akiyoshi Tamura and Hirotaka Miyamoto. These collaborations have enriched his work and paved the way for innovative solutions in the semiconductor industry.

Conclusion

Keiichi Murayama exemplifies the spirit of innovation, with a strong focus on creating effective solutions in semiconductor technology. His patents and collaborative efforts depict a relentless pursuit of excellence, ensuring his impact on the industry will be long-lasting.

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