Company Filing History:
11 out of 2,510 
3 out of 164,197 
Years Active: 2007-2021
Title: Keiichi Kurashina: Innovator in Substrate Processing Technology
Introduction
Keiichi Kurashina is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of substrate processing, holding a total of 11 patents. His innovative designs and technologies have advanced the capabilities of substrate processing apparatuses.
Latest Patents
One of his latest patents is a substrate processing apparatus that features a processing chamber with an outer chamber designed to hold a processing liquid. The inner chamber is capable of surrounding the substrate held by a substrate holder. This apparatus includes a liquid delivery pipe that connects the inner chamber to the outer chamber, along with a pump that facilitates the movement of the processing liquid. Additionally, a guide cover with a through-hole allows for the insertion of the substrate holder, enhancing the efficiency of the processing system.
Career Highlights
Throughout his career, Keiichi Kurashina has worked with notable companies such as Ebara Corporation and IBM. His experience in these organizations has contributed to his expertise in substrate processing technologies and has allowed him to develop innovative solutions in this field.
Collaborations
Keiichi has collaborated with several talented individuals, including Satoru Yamamoto and Hiroyuki Kanda. These partnerships have fostered a creative environment that has led to the development of advanced technologies in substrate processing.
Conclusion
Keiichi Kurashina's contributions to substrate processing technology are noteworthy, and his patents reflect his innovative spirit. His work continues to influence the industry and pave the way for future advancements.