Keiichi Fujita

Title: Keiichi Fujita: Innovator in Substrate Processing Technology

Introduction

Keiichi Fujita is a prominent inventor based in Nirasaki, Japan. He has made significant contributions to the field of substrate processing technology, holding a total of 3 patents. His work focuses on improving methods and apparatuses for processing substrates, which are essential in various manufacturing processes.

Latest Patents

Fujita's latest patents include a substrate liquid processing apparatus, a substrate liquid processing method, and a recording medium. The substrate processing apparatus is designed to hold and rotate a substrate with a recess and an exposed base metal layer. It features a pre-cleaning liquid supply that applies a pre-cleaning liquid, such as dicarboxylic acid or tricarboxylic acid, to the substrate at temperatures equal to or higher than 40°C. The substrate processing method involves performing plating on a substrate with an impurity-doped polysilicon film. This method includes forming a catalyst layer using an alkaline catalyst solution and subsequently applying a plating liquid for electroless plating.

Career Highlights

Fujita is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His innovative approaches have contributed to advancements in substrate processing, enhancing the efficiency and effectiveness of manufacturing processes.

Collaborations

Throughout his career, Fujita has collaborated with notable colleagues, including Takashi Tanaka and Yuichiro Inatomi. These collaborations have fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Keiichi Fujita's work in substrate processing technology exemplifies the impact of innovation in the manufacturing sector. His patents and contributions continue to influence the industry, showcasing the importance of research and development in advancing technology.