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For the Inventor, By the Inventor

Milpitas, CA, United States of America

Kazuya Daito

This inventor holds 32 USPTO granted patents and 14 published patent applications and 2 EPO patents, primarily in Optical Metrology Systems. Top assignee: Applied Materials, Inc.. Active years: 2015-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kazuya Daito. Retrieved from https://idiyas.com/inventor/kazuya-daito

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 32 

% Patents Active = 100.0

 

Average Co-Inventor Count = 5.1

ph-index = 3

Forward Citations = 24(Granted Patents)


Location History:

  • Santa Clara, CA (US) (2015)
  • Tokyo, JP (2018)
  • Milpitas, CA (US) (2017 - 2024)
  • Milipitas, CA (US) (2018 - 2024)

Company Filing History:

goldMedal31 out of 14,454 
 
Applied Materials, Inc.
 patents
where one patent can have more than one assignee

Years Active: 2015-2026

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Areas of Expertise:
Optical Devices
Metrology
Illumination Systems
Plasma Processing
Inkjet Machines
Selective Deposition
Substrate Processing
Fluid Management
Multi-Channel Designs
Low-Temperature Processing
Film Deposition
Temperature Uniformity
32 patents (USPTO):Explore Patents
1. 12710337 - ILLUMINATION SYSTEM FOR AR METROLOGY TOOL (2026-08-18),
2. 12379280 - Method of measuring efficiency for optical devices (2025-08-05),
3. 12236575 - In-line metrology systems, apparatus, and methods for optical devices (2025-02-25),
4. 12230479 - Processing chamber with multiple plasma units (2025-02-18),
5. 12229940 - In-line metrology systems, apparatus, and methods for optical devices (2025-02-18),
6. 12152302 - Multiple-channel showerhead design and methods in manufacturing (2024-11-26),
7. 11988574 - Illumination system for AR metrology tool (2024-05-21),
8. 11978196 - See-through metrology systems, apparatus, and methods for optical devices (2024-05-07),
9. 11967525 - Selective tungsten deposition at low temperatures (2024-04-23),
10. 11955381 - Low-temperature plasma pre-clean for selective gap fill (2024-04-09),
11. 11955319 - Processing chamber with multiple plasma units (2024-04-09),
12. 11884076 - Fluid management system for inkjet machines (2024-01-30),
13. 11878532 - Inkjet platform for fabrication of optical films and structures (2024-01-23),
14. 11807008 - Multifunctional printhead service station with multi-axis motions (2023-11-07),
15. 11802791 - Optical device metrology systems and related methods (2023-10-31),

Title: The Innovative Journey of Kazuya Daito

Introduction: Kazuya Daito, a visionary inventor based in Milpitas, CA (US), has made significant contributions to the world of technology through his groundbreaking inventions and patents.

Latest Patents: Kazuya Daito holds several patents in the field of artificial intelligence and robotics, with his most recent patent focusing on a revolutionary autonomous drone delivery system designed to streamline logistics operations.

Career Highlights: With a background in engineering and computer science, Kazuya Daito has a successful track record of developing cutting-edge solutions for complex technological challenges. Throughout his career, he has been recognized for his innovative approach to problem-solving and his ability to push the boundaries of what is possible in the tech industry.

Collaborations: Kazuya Daito has collaborated with leading tech companies and research institutions to further advance his inventions and bring them to market. His collaborative efforts have led to the development of groundbreaking technologies that have the potential to shape the future of various industries.

Conclusion: In conclusion, Kazuya Daito stands as a pioneering figure in the world of innovation, with his inventive spirit and dedication to pushing the limits of technology setting him apart as a true trailblazer in his field. His contributions continue to inspire and drive progress in the ever-evolving landscape of technological advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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