Applied Materials, Inc.

Kazuya Daito

Yi Xu

Yu Lei

Ludovic Godet

Dien-Yeh Wu

Jinxin Fu

Yangyang Sun

Jallepally Ravi

Vikash Banthia

Yufei Hu

Mei Yin Chang

Kai Wu

Takashi Kuratomi

Pingyan Lei

Avgerinos V Gelatos

Daihua Zhang

Xiaoxiong Yuan

Sang-Hyeob Lee

Kang Luo

Alexey Stepanov

Da He

Elsa Massonneau

Visweswaren Sivaramakrishnan

He Ren

Sang Ho Yu

Umesh M Kelkar

Gwo-Chuan Tzu

Mahendran Chidambaram

Guoqiang Jian

Chi-Chou Lin

Hemantha Raju

Feiyue Ma

Bahubali S Upadhye

Jiajie Cen

Kenneth S Ledford

David P Thompson

Xianmin Tang

Yixiong Yang

Yong Cao

Zhebo Chen

Xinyu Fu

Joshua Collins

Wei V Tang

Yu Wen Chang

Joel M Huston

Sundar Ramamurthy

Shih Chung Chen

Raymond Hoiman Hung

David T Or

Liqi Wu

Lin Dong

Xi Cen

Faruk Gungor

Steven C Hung

Jing Zhou

Luping Li

Shi You

Rajkumar Jakkaraju

Jenn-Yue Wang

Harpreet Singh

Geraldine M Vasquez

Pulkit Agarwal

Kiejin Park

Benjamin C Wang

Kie Jin Park

Yiming Lai

Jonathan Robert Bakke

Jia Ye

Yakuan Yao

John Rusconi

Michael David-Scott Kemp

Bin V Cao

Vijay Venugopal

Embodiments of the present disclosure relate to measurement systems and methods of measuring efficiency of optical devices. In one example, the measurement systems include a light source, a mirror, an illumination source, and a sensor. The light source provides a light beam to the optical device to be diffracted into diffraction beams having diffraction orders. The diffractions beams form a diffraction pattern. The method includes positioning the optical device in the measurement system and directing the diffraction beams to the sensor. The sensor is operable to measure the efficiency of the optical device by measuring the diffraction pattern.

Method of measuring efficiency for optical devices

Embodiments of the present disclosure relate to optical devices for augmented, virtual, and/or mixed reality applications. In one or more embodiments, an optical device metrology system is configured to measure a plurality of first metrics and one or more second metrics for optical devices, the one or more second metrics including a display leakage metric.

In-line metrology systems, apparatus, and methods for optical devices

Provided is a processing chamber configured to contain a semiconductor substrate in a processing region of the chamber. The processing chamber includes a remote plasma unit and a direct plasma unit, wherein one of the remote plasma unit or the direct plasma unit generates a remote plasma and the other of the remote plasma unit or the direct plasma unit generates a direct plasma. The combination of a remote plasma unit and a direct plasma unit is used to remove, etch, clean, or treat residue on a substrate from previous processing and/or from native oxide formation. The combination of a remote plasma unit and direct plasma unit is used to deposit thin films on a substrate.

Processing chamber with multiple plasma units

A method and apparatus for producing a gas distribution apparatus are described herein. More specifically, a method and apparatus for producing triple-channel gas distribution apparatus is described herein. The gas distribution apparatus described herein includes an upper plate, a middle plate, and a lower plate. The middle plate and the lower plate are machined before all of the upper plate, the middle plate, and the lower plate are bonded. Additional machining is then performed on the gas distribution apparatus. The gas distribution apparatus is used to distribute three or more process gases into a processing chamber.

Multiple-channel showerhead design and methods in manufacturing

Embodiments described herein provide for light engines of a measurement system and methods of using the light engines. The measurement system includes a light engine operable to illuminate a first grating of an optical device. The light engine projects a pattern with a light from a light engine. The light engine projects a pattern to the first grating such that a metrology metric may be extracted from one or more images captured by a detector of the measurement system. The metrology metrics are extracted by processing the image. The metrology metrics determine if the optical device meets image quality standards.

Illumination system for AR metrology tool

Embodiments of the present disclosure relate to optical devices for augmented, virtual, and/or mixed reality applications. In one or more embodiments, an optical device metrology system is configured to measure a plurality of see-through metrics for optical devices.

See-through metrology systems, apparatus, and methods for optical devices

Embodiments of the disclosure relate to methods of depositing tungsten. Some embodiments of the disclosure provide methods for depositing tungsten which are performed at relatively low temperatures. Some embodiments of the disclosure provide methods in which the ratio between reactant gasses is controlled. Some embodiments of the disclosure provide selective deposition of tungsten. Some embodiments of the disclosure provide methods for depositing tungsten films at a low temperature with relatively low roughness, stress and impurity levels.

Selective tungsten deposition at low temperatures

Methods for pre-cleaning substrates having metal and dielectric surfaces are described. A temperature of a pedestal comprising a cooling feature on which a substrate is located is set to less than or equal to 100° C. The substrate is exposed to a plasma treatment to remove chemical residual and/or impurities from features of the substrate including a metal bottom, dielectric sidewalls, and/or a field of dielectric and/or repair surface defects in the dielectric sidewalls and/or the field of the dielectric. The plasma treatment may be an oxygen plasma, for example, a direct oxygen plasma. Processing tools and computer readable media for practicing the method are also described.

Low-temperature plasma pre-clean for selective gap fill

Embodiments described herein provide for a fluid management system and a method of utilizing the fluid management system. The fluid management system includes a servicing fluid management system and an ink management system. The servicing fluid management system and the ink management system run in parallel within an inkjet chamber. The ink management system supports the flow of inkjet materials between a waste tank, one or more inkjet material supply tanks, an ink management module, and the inkjet printer. The servicing fluid management system supports the flow of servicing fluids between the waste tank, one or more servicing fluid supply tanks, a servicing fluid management module, and the inkjet printer.

Fluid management system for inkjet machines

Embodiments described herein relate to an inkjet printing platform. The inkjet printing platform is utilized for fabrication of optical films and optical device structures. The inkjet printing platform includes a transfer chamber, one or more inkjet chambers, a plurality of auxiliary modules, a substrate flipper, and load ports. The inkjet printing platform is operable to perform an inkjet printing process on a substrate to form an optical film and/or an optical device.

Inkjet platform for fabrication of optical films and structures

Embodiments described herein relate to an inkjet service station and methods of servicing an inkjet printer with the inkjet service station. The inkjet service station is disposed in an inkjet printer of an inkjet chamber. The inkjet service station is operable to perform servicing operations on a processing apparatus of the inkjet printer. The servicing operations include at least one of printhead spitting, printhead purging, printhead flushing, printhead cleaning, printhead drying, or vacuum suction.

Multifunctional printhead service station with multi-axis motions

A method of optical device metrology is provided. The method includes providing a first type of light into a first optical device during a first time period; measuring a quantity of the first type of light transmitted from a first location on the top surface or the bottom surface during the first time period; coating at least a portion of an edge of the one or more edges with a first coating of optically absorbent material during a second time period that occurs after the first time period; providing the first type of light into the first optical device during a third time period that occurs after the second time period; and measuring a quantity of the first type of light transmitted from the first location on the top surface or the bottom surface during the third time period.

Optical device metrology systems and related methods

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Milipitas, CA, United States of America

Kazuya Daito