Location History:
- Kumamoto, JP (2017)
- Kikuchi, JP (2018)
Company Filing History:
3 out of 10,341 
2 out of 54,780 
Years Active: 2017-2024
Title: Kazutaka Noda: Innovator in Substrate Separation Technologies
Introduction
Kazutaka Noda is a prominent inventor based in Kikuchi, Japan. He has made significant contributions to the field of substrate separation technologies, holding a total of 3 patents. His innovative approaches have paved the way for advancements in various applications.
Latest Patents
Noda's latest patents include a separating method, a separating apparatus, and a separating system. The separating method involves holding a combined substrate and separating a first substrate. In this process, the combined substrate, which consists of a first substrate and a second substrate bonded together, is held securely. The separation of the first substrate begins at the side surface of the combined substrate, utilizing a fluid containing water to facilitate the process. The separation apparatus is designed to separate a superposed substrate, where a processing target substrate and a supporting substrate are joined with adhesive. This apparatus includes a first holding unit for the processing target substrate, a second holding unit for the supporting substrate, a moving mechanism for horizontal movement, a load measurement unit to assess the load during separation, and a control unit that manages the moving mechanism based on the measured load.
Career Highlights
Throughout his career, Kazutaka Noda has worked with notable companies such as Tokyo Electron Limited and Intel Corporation. His experience in these leading technology firms has contributed to his expertise in substrate separation technologies.
Collaborations
Noda has collaborated with esteemed colleagues, including Masaru Honda and Akira Fukutomi. These partnerships have further enhanced his innovative work in the field.
Conclusion
Kazutaka Noda's contributions to substrate separation technologies demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the complexities involved in substrate processing, making him a key figure in this area of technology.