Tokyo, Japan

Kazuo Ushida


Average Co-Inventor Count = 2.9

ph-index = 12

Forward Citations = 440(Granted Patents)


Location History:

  • Setagaya-ku, JP (1997 - 2005)
  • Tokyo, JP (1983 - 2007)

Company Filing History:


Years Active: 1983-2007

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22 patents (USPTO):Explore Patents

Certainly! Here is the article about inventor Kazuo Ushida:

Title: Innovator Spotlight: Kazuo Ushida - Pioneering Projection Exposure Technology

Introduction:

Kazuo Ushida, a highly skilled inventor based in Tokyo, Japan, has made significant contributions to the field of projection exposure technology. With an impressive portfolio of 22 patents to his name, Ushida's groundbreaking work has revolutionized the way projection exposure apparatus are designed and operated.

Latest Patents:

Two of Ushida's latest patents showcase his expertise in creating high-performance projection exposure apparatus. One of his patents involves the design of a projection exposure apparatus with illuminating optical means and projection optical means that satisfy specific conditions to enhance efficiency. The other patent focuses on adjusting rotationally asymmetric optical characteristics within the projection optical system for optimal performance.

Career Highlights:

Throughout his career, Ushida has worked with renowned companies such as Nikon Corporation and Nippon Kogaku K.K., where he honed his skills and expertise in optical technology. His innovative approach to projection exposure technology has earned him recognition as a leader in the field.

Collaborations:

Ushida has collaborated with esteemed colleagues such as Kyoichi Suwa and Masaomi Kameyama, who have contributed to the success of his projects. Together, they have worked on advancing optical elements with rotationally asymmetric powers to correct optical characteristics within projection optical systems.

Conclusion:

In conclusion, Kazuo Ushida's relentless pursuit of innovation and excellence in projection exposure technology has cemented his reputation as a visionary inventor. His groundbreaking patents and collaborative efforts with industry experts have greatly influenced the field of optical technology, paving the way for future advancements in projection exposure apparatus design and functionality.

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