The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 11, 2000
Filed:
Mar. 13, 1998
Hideki Komatsuda, Kawasaki, JP;
Kazuo Ushida, Tokyo, JP;
Nikon Corporation, Tokyo, JP;
Abstract
An illumination apparatus is provided capable of obtaining identical line widths at all positions in an image surface. A projection exposure apparatus using this illumination apparatus is also provided as well as a method of manufacturing the projection exposure apparatus and a method of manufacturing a device using this apparatus. The illumination apparatus includes a light source system for supplying a light beam, an optical integrator for forming a plurality of light sources based on a light beam from the light source and a condenser optical system for converging beams from the plurality of light sources for illuminating an illuminated surface. The apparatus also has a filter placed in a location that is in an optically conjugate relationship to the illuminated surface. The filter has at least a first area corresponding to a first portion of the plurality of light sources, and a second area corresponding to a second portion of the plurality of light sources other than the first portion. The filter has at least one first filter element having a first transmissivity distribution provided over the entirety of the first area of the filter. The filter also has at least one second filter element having a second transmissivity distribution that is the inverse of the first transmissivity distribution provided over the entirety of the second area of the filter.