The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 28, 2007

Filed:

May. 24, 1999
Applicants:

Kazuo Ushida, Tokyo, JP;

Masaomi Kameyama, Tokyo, JP;

Takashi Mori, Tokyo, JP;

Inventors:

Kazuo Ushida, Tokyo, JP;

Masaomi Kameyama, Tokyo, JP;

Takashi Mori, Tokyo, JP;

Assignee:

Nikon Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/027 (2005.12); G03F 7/20 (2005.12); G03B 27/42 (2005.12); G03B 27/54 (2005.12); G03B 27/72 (2005.12);
U.S. Cl.
CPC ...
Abstract

A projection exposure apparatus includes illuminating optical means for illuminating a projection negative, and projection optical means for projection-exposing the projection negative illuminated by the illuminating optical means onto a substrate, the illuminating optical means including light source means for supplying exposure light, annular light source forming means for forming an annular secondary light source by the light from the light source means, and condenser means for condensing the light beam from the annular light source forming means on the projection negative, and is designed to satisfy the following condition:⅓≦d/d≦⅔,where dis the inner diameter of the annular secondary light source, and dis the outer diameter of the annular secondary light source.


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