Kudamatsu, Japan

Kazuo Takata


Average Co-Inventor Count = 4.3

ph-index = 2

Forward Citations = 51(Granted Patents)


Location History:

  • Yamaguchi, JP (2004)
  • Kudamatsu, JP (1992 - 2012)

Company Filing History:


Years Active: 1992-2012

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4 patents (USPTO):Explore Patents

Title: **Kazuo Takata: Innovator in Etching Technology**

Introduction

Kazuo Takata, an accomplished inventor based in Kudamatsu, Japan, has made significant contributions to the field of etching technology. With a total of four patents to his name, his work focuses on enhancing the precision and efficiency of etching processes in semiconductor manufacturing.

Latest Patents

Among his most notable patents is an innovative etching method and etching equipment designed to achieve trench etching without causing damage to the side walls while maintaining a high etching rate. This plasma etching method enables the formation of grooves or holes in a silicon substrate through the utilization of a mixed gas plasma consisting of sulfur hexafluoride (SF6) and oxygen (O2), occasionally supplemented by hydrogens within a specified concentration range. Moreover, his method for etching SOI substrates involves forming a mixed gas plasma using fluorinated and oxygenic gases, coupled with a temporally modulated high-frequency bias, resulting in improved yielding rates and enhanced productivity.

Career Highlights

Kazuo Takata has established himself as a key player in semiconductor technology through his tenure at prominent organizations, including Hitachi High-Technologies Corporation and Hitachi, Ltd. His experience in these influential companies has greatly informed his innovative approach to etching techniques.

Collaborations

In his journey, Takata has collaborated with notable colleagues such as Yutaka Kudou and Satoshi Tani. These partnerships have fostered an environment of shared knowledge and creativity, accelerating advancements in etching technology.

Conclusion

Kazuo Takata exemplifies the spirit of innovation in the semiconductor industry. Through his groundbreaking patents and collaborations, he continues to contribute to the evolution of etching processes, ensuring greater efficiency and accuracy in manufacturing practices. His work not only enhances current technologies but also paves the way for future advancements in the field.

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