Komae, Japan

Kazunori Imaoka

This inventor holds 15 USPTO granted patents. Top assignee: Fujitsu Corporation. Active years: 1986-1996.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kazunori Imaoka. Retrieved from https://idiyas.com/inventor/kazunori-imaoka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.9

ph-index = 9

Forward Citations = 190(Granted Patents)


Location History:

  • Tokyo, JP (1993)
  • Komae, JP (1986 - 1996)

Company Filing History:


Years Active: 1986-1996

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15 patents (USPTO):Explore Patents

Title: Kazunori Imaoka: Innovator in Semiconductor Technology

Introduction

Kazunori Imaoka is a prominent inventor based in Komae, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 15 patents. His work focuses on improving the efficiency and functionality of semiconductor devices.

Latest Patents

One of Kazunori Imaoka's latest patents is titled "Semiconductor device having SOI substrate and fabrication method thereof." This patent describes a semiconductor device that includes a semiconductor layer with a first surface and a second surface that is comparatively lower than the first surface. The device features a first material layer formed over the second surface, which consists of an inorganic material with a hardness exceeding that of the semiconductor layer. Additionally, it includes a second material layer with a hardness less than that of the first material layer, positioned in a gap between the sidewall of the first material layer and the sidewall between the first and second surfaces. The first surface of the semiconductor layer is lapped until it is substantially flush with the top surface of the first material layer.

Another notable patent is the "Method of fabricating semiconductor devices using an intermediate." This invention addresses the challenges faced during wafer processes. It involves removing brittle, excessive deposition on the edge of a semiconductor wafer by grinding or etching until the underlying wafer is exposed. This method reduces dust generation caused by cracks and peel-off of the excessive deposition, thereby improving production yields of highly integrated semiconductor devices.

Career Highlights

Kazunori Imaoka is currently employed at Fujitsu Corporation, where he continues to innovate in semiconductor technology. His work has been instrumental in advancing the capabilities of semiconductor devices, making them more efficient and reliable.

Collaborations

Throughout his career, Kazunori has collaborated with notable colleagues, including Takao Miura and Takeshi Matsutani. These collaborations have contributed to the development of groundbreaking technologies in the semiconductor field.

Conclusion

Kazunori Imaoka's contributions to semiconductor technology through his patents and work at Fujitsu Corporation highlight his role as a leading inventor in the industry. His innovative approaches continue to shape the future of semiconductor devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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