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For the Inventor, By the Inventor

Tokyo, Japan

Kazunobu Maeshige

This inventor holds 11 USPTO granted patents and 5 published patent applications and 4 EPO patents. Top assignees: Agc Inc., Asahi Glass Company, Limited. Active years: 2015-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kazunobu Maeshige. Retrieved from https://idiyas.com/inventor/kazunobu-maeshige

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 11 

% Patents Active = 81.8

 

Average Co-Inventor Count = 4.1

ph-index = 2

Forward Citations = 4(Granted Patents)


Location History:

  • Chiyoda-ku, JP (2015 - 2018)
  • Tokyo, JP (2016 - 2022)

Company Filing History:

goldMedal6 out of 1,147 
 
Agc Inc.
 patents
silverMedal5 out of 2,560 
 
Asahi Glass Company, Limited
 patents

Years Active: 2015-2025

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11 patents (USPTO):Explore Patents
1. 12265202 - Far-infrared ray transmission member and method for manufacturing far-infrared ray transmission member (2025-04-01),
2. 11286201 - Cover glass and glass laminate (2022-03-29),
3. 10677963 - Curved substrate with film, method for producing the same, and image display device (2020-06-09),
4. 10501369 - Translucent substrate, organic LED element and method of manufacturing translucent substrate (2019-12-10),
5. 10239783 - Method of producing glass substrate and glass substrate (2019-03-26),
6. 10204767 - Plasma source for a plasma CVD apparatus and a manufacturing method of an article using the plasma source (2019-02-12),
7. 9988303 - Coating film-equipped glass substrate, and method for producing coating film-equipped glass substrate (2018-06-05),
8. 9922805 - Plasma source for a plasma CVD apparatus and a manufacturing method of an article using the plasma source (2018-03-20),
9. 9423684 - Reflective mask blank for EUV lithography and process for its production (2016-08-23),
10. 9097976 - Reflective mask blank for EUV lithography (2015-08-04),
11. 9086629 - Substrate with conductive film, substrate with multilayer reflective film and reflective mask blank for EUV lithography (2015-07-21),

Title: The Innovative Journey of Kazunobu Maeshige

Introduction:

Kazunobu Maeshige is a pioneering inventor hailing from Tokyo, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents:

Maeshige's recent patents include advancements in artificial intelligence algorithms for autonomous vehicles, wearable technology for healthcare monitoring, and sustainable energy solutions for urban environments.

Career Highlights:

With over two decades of experience in research and development, Maeshige has held key positions in leading tech companies, driving innovation and pushing the boundaries of what is possible in the tech industry.

Collaborations:

Throughout his career, Maeshige has collaborated with top researchers, engineers, and designers from renowned universities and research institutions worldwide, fostering a culture of creativity and excellence in his projects.

Conclusion:

Kazunobu Maeshige's relentless pursuit of innovation and his passion for creating solutions that positively impact society make him a true visionary in the world of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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