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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9922805 B1

PDFFull Text
Date of Patent:
Mar. 20, 2018

Filed:

Apr. 29, 2015

Plasma source for a plasma cvd apparatus and a manufacturing method of an article using the plasma source

Applicant:

Asahi Glass Company, Limited, Tokyo, JP;

Inventors:

Hirotomo Kawahara, Tokyo, JP;

Nobutaka Aomine, Tokyo, JP;

Kazunobu Maeshige, Tokyo, JP;

Yuki Aoshima, Tokyo, JP;

Hiroshi Hanekawa, Tokyo, JP;

Assignee:

Asahi Glass Company, Limited, Tokyo, JP;

Attorney:

Oblon, McClelland, Maier & Neustadt, L.L.P.

Primary Examiner:

Joel G Horning

Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 16/50 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32568 (2013.01); C23C 16/50 (2013.01); H01J 37/3244 (2013.01); H01J 2237/3321 (2013.01);
Abstract

A plasma source for a plasma CVD apparatus that includes an electrode group including four electrodes, which are a first electrode, a second electrode, a third electrode and a fourth electrode arranged in a row. The electrode group is connected to at least one AC power supply. A voltage supplied to two of the four electrodes is shifted in phase from a voltage supplied to the remaining two electrodes. A space to which a source gas is supplied is provided between the adjacent electrodes, and voltages applied to at least one set among the adjacent two electrodes are in the same phase.

Find Patent Forward Citations

Kawahara, Hirotomo. (2018). Plasma source for a plasma cvd apparatus and a manufacturing method of an article using the plasma source (U.S. Patent No. 9922805). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9922805

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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