Oshu, Japan

Katsuyoshi Aikawa


 

Average Co-Inventor Count = 2.7

ph-index = 5

Forward Citations = 51(Granted Patents)


Location History:

  • Saitama, JP (2001)
  • Tokyo, JP (2006)
  • Kai, JP (2013)
  • Iwate, JP (2014 - 2019)
  • Oshu, JP (2018 - 2021)

Company Filing History:


Years Active: 2001-2025

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10 patents (USPTO):Explore Patents

Title: Innovator Katsuyoshi Aikawa: Pioneering Advances in Substrate Processing Technology

Introduction

Katsuyoshi Aikawa, an accomplished inventor based in Oshu, Japan, has made significant contributions to the field of substrate processing technology. With a remarkable portfolio consisting of 10 patents, Aikawa’s work exemplifies innovation and precision in design, making him a notable figure in the realm of technological advancements.

Latest Patents

Among his latest creations are two innovative patents that showcase his technical expertise. The first is a **Mounting Table and Substrate Processing Apparatus**, which features a dielectric plate integrated with a substrate support for efficient processing. The design includes a through-hole for easy fastening, enhancing the adaptability and reliability of the mounting table.

The second patent, **Film Forming Method and Recording Medium**, introduces a film forming apparatus that utilizes a rotary table and advanced processing gas supply mechanisms. This innovation allows for precise control over the substrate's rotation speed, optimizing the film formation process and ensuring high-quality outputs.

Career Highlights

Throughout his career, Katsuyoshi Aikawa has worked with esteemed companies such as Tokyo Electron Limited and Taisho Pharmaceutical Co., Ltd. His roles in these organizations have allowed him to refine his skills and contribute to groundbreaking technologies in the semiconductor and pharmaceutical fields.

Collaborations

Aikawa’s journey in innovation has been shaped by collaborative efforts with talented individuals in the industry. Notably, he has worked alongside colleagues Hitoshi Kato and Shigehiro Miura, sharing expertise and insights that have driven forward their collective ambitions in technology development.

Conclusion

Katsuyoshi Aikawa stands out as a prominent inventor whose patents in substrate processing contribute to advancements in technology. His work not only reflects his innovative spirit but also paves the way for future developments in the field, ensuring his legacy as a key player in the industry.

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