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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9404184 B1

PDFFull Text
Date of Patent:
Aug. 02, 2016

Filed:

Dec. 12, 2013

Substrate position detecting apparatus, substrate processing apparatus using substrate position detecting apparatus, and deposition apparatus

Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventor:

Katsuyoshi Aikawa, Iwate, JP;

Assignee:

Tokyo Electron Limited, Tokyo, JP;

Attorney:

IPUSA, PLLC

Primary Examiner:

Charles Capozzi

Int. Cl.
CPC ...
C23C 16/52 (2006.01); C23C 16/44 (2006.01); C23C 16/455 (2006.01); H01L 21/67 (2006.01); H01L 21/68 (2006.01); H01L 21/687 (2006.01); G01N 21/15 (2006.01); G01N 21/95 (2006.01);
U.S. Cl.
CPC ...
C23C 16/52 (2013.01); C23C 16/44 (2013.01); C23C 16/45551 (2013.01); H01L 21/67259 (2013.01); H01L 21/681 (2013.01); H01L 21/68764 (2013.01); H01L 21/68771 (2013.01); G01N 21/15 (2013.01); G01N 21/9501 (2013.01);
Abstract

A substrate position detecting apparatus detects a position of a substrate inside a chamber from an image of a target inside the chamber. The apparatus includes an image pickup device to pick up the image of the target inside the chamber through a window, an illumination device to irradiate light upwards, an illumination reflecting plate provided above the illumination device and including a reflecting surface to reflect the light from the illumination device towards the window, and a reflection restricting part provided on the reflecting surface to form a shadow in a predetermined region that includes the target inside the chamber.

Find Patent Forward Citations

Aikawa, Katsuyoshi. (2016). Substrate position detecting apparatus, substrate processing apparatus using substrate position detecting apparatus, and deposition apparatus (U.S. Patent No. 9404184). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9404184

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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