This inventor holds 6 USPTO granted patents. Top assignees: Ebara Corporation, Kabushiki Kaisha Toshiba, Other. Active years: 2003-2019.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Sagamihara, JP (2003 - 2006)
- Tokyo, JP (2005 - 2019)
Company Filing History:
5 out of 2,579 
1 out of 53,276 
1 out of 834,570 Years Active: 2003-2019
Title: Innovations of Katsuhiko Tokushige
Introduction
Katsuhiko Tokushige is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of substrate processing and polishing apparatuses. With a total of 6 patents to his name, Tokushige's work has advanced the technology used in semiconductor manufacturing.
Latest Patents
One of his latest patents is a substrate processing apparatus that includes a polisher designed to polish a substrate using a polishing liquid. This apparatus features a first cleaner that utilizes sulfuric acid and hydrogen peroxide water to clean the polished substrate. Additionally, a second cleaner is employed to further clean the substrate using a basic chemical liquid and hydrogen peroxide water. Finally, a drier is included to dry the substrate after cleaning. Another significant invention is a polishing apparatus intended for polishing workpieces, such as semiconductor wafers, to a flat mirror finish. This apparatus consists of a polishing table with a polishing surface and a top ring, where the workpiece is pressed at a predetermined pressure for effective polishing. It also includes at least two dressing units that contact the polishing surface, which is made of polishing cloth.
Career Highlights
Throughout his career, Katsuhiko Tokushige has worked with Ebara Corporation, a leading company in the field of semiconductor manufacturing equipment. His innovations have played a crucial role in enhancing the efficiency and effectiveness of substrate processing technologies.
Collaborations
Tokushige has collaborated with notable professionals in his field, including Norio Kimura and Kenji Kamimura. Their combined expertise has contributed to the development of advanced technologies in substrate processing.
Conclusion
Katsuhiko Tokushige's contributions to the field of substrate processing and polishing apparatuses have made a significant impact on semiconductor manufacturing. His innovative patents and collaborations highlight his role as a leading inventor in this technology sector.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile