Company Filing History:
Years Active: 2006-2009
Title: Celebrating the Innovations of Inventor Karen Mai
Introduction: Karen Mai, a prominent inventor based in Jhonghe, Taiwan, has made significant contributions to the semiconductor industry. With two registered patents to her name, Karen's work focuses on enhancing transistor performance through innovative semiconductor technologies.
Latest Patents: Among her latest innovations, Karen Mai has developed a patent titled "Profile confinement to improve transistor performance." This invention discloses a semiconductor device featuring well-defined profiles, where a p-type pocket or halo region is strategically formed along the channel-side border of heavily doped source/drain regions. This design effectively neutralizes diffused n-type elements. Additionally, her other patent describes a method for fabricating a portion of an integrated circuit on a semiconductor substrate. This method includes cleaning the substrate's surface, forming a thin insulator, and depositing a high dielectric constant (high-k) material. It also involves performing sequential hydrogen-based and oxygen-based anneals on the high-k material, showcasing her innovative approach to semiconductor fabrication.
Career Highlights: Karen Mai currently works at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor manufacturing industry. Her expertise and innovations have positioned her as a vital contributor to the evolution of modern semiconductor technologies, paving the way for improved electronic devices.
Collaborations: Throughout her career, Karen has collaborated with notable colleagues such as Chien-Hao Chen and Chun-Feng Nieh. These partnerships have enriched her research and development efforts, fostering a collaborative environment that pushes the boundaries of semiconductor advancements.
Conclusion: Karen Mai's contributions to the semiconductor industry through her patents demonstrate her commitment to innovation and excellence. Her work not only enhances transistor performance but also exemplifies the advancements in semiconductor fabrication techniques. As an inventor, she continues to inspire future generations of engineers and innovators, highlighting the importance of research and collaboration in driving technological progress.