Company Filing History:
Years Active: 2021-2024
Title: Innovations of Kang Zhang in the Field of Physical Vapor Deposition
Introduction
Kang Zhang is a prominent inventor based in Singapore, known for his significant contributions to the field of physical vapor deposition (PVD). With a total of 10 patents to his name, Zhang has developed innovative technologies that enhance the efficiency and effectiveness of various processes in semiconductor manufacturing.
Latest Patents
Among his latest patents, Zhang has introduced a shutter disk that comprises one or more of titanium (Ti), barium (Ba), or cerium (Ce). This invention is designed to minimize outgassing and control defects during the etching of a substrate. The shutter disks incorporate getter materials that are highly selective to reactive gas molecules, including oxygen, carbon monoxide, and water. Another notable patent is the high conductance inner shield for process chambers. This invention includes a tubular body with a central opening configured to surround a substrate support, ensuring that the sidewalls do not include any through holes. The top plate of this process kit has a gas inlet and a diameter greater than that of the tubular body, allowing for improved gas flow and process efficiency.
Career Highlights
Kang Zhang has made a significant impact in the semiconductor industry through his work at Applied Materials, Inc. His innovative designs and patents have contributed to advancements in manufacturing processes, making them more reliable and efficient.
Collaborations
Zhang has collaborated with notable coworkers such as Yueh Sheng Ow and Junqi Wei, further enhancing the innovative capabilities within his team.
Conclusion
Kang Zhang's contributions to the field of physical vapor deposition through his patents and collaborative efforts have established him as a key figure in semiconductor innovation. His work continues to influence the industry and drive technological advancements.
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