The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 19, 2024
Filed:
Nov. 21, 2023
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Kang Zhang, Singapore, SG;
Junqi Wei, Singapore, SG;
Yueh Sheng Ow, Singapore, SG;
Kelvin Boh, Singapore, SG;
Yuichi Wada, Chiba, JP;
Ananthkrishna Jupudi, Singapore, SG;
Sarath Babu, Singapore, SG;
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/48 (2006.01); H01L 21/02 (2006.01); H01L 21/322 (2006.01); H01L 21/50 (2006.01); H01L 21/60 (2006.01); H01L 21/67 (2006.01); H01L 21/768 (2006.01); H01L 23/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/4853 (2013.01); H01L 21/02043 (2013.01); H01L 21/322 (2013.01); H01L 21/50 (2013.01); H01L 21/67011 (2013.01); H01L 21/76841 (2013.01); H01L 24/11 (2013.01); H01L 24/94 (2013.01); H01L 2021/60052 (2013.01);
Abstract
Describes are shutter disks comprising one or more of titanium (Ti), barium (Ba), or cerium (Ce) for physical vapor deposition (PVD) that allows pasting to minimize outgassing and control defects during etching of a substrate. The shutter disks incorporate getter materials that are highly selective to reactive gas molecules, including O, CO, CO, and water.