Kaidong Xu

Title: The Innovative Contributions of Kaidong Xu

Introduction

Kaidong Xu is a prominent inventor based in Leuven, Belgium, known for his significant contributions to semiconductor technology. With a total of nine patents to his name, Xu has made remarkable advancements in the field of semiconductor device manufacturing.

Latest Patents

One of his latest patents is a semiconductor device manufacturing method. This method involves a sophisticated etching apparatus that includes a sample loading chamber, a vacuum transition chamber, a reactive ion plasma etching chamber, an ion beam etching chamber, a film coating chamber, and a vacuum transport chamber. The process begins with reactive ion etching to create an isolation layer, followed by ion beam etching to reach a fixed layer while leaving a small portion of it intact. The method concludes with reactive ion etching to the bottom electrode metal layer and ion beam cleaning to eliminate metal residues and treat the sample surface.

Another notable patent is the inductively coupled plasma treatment system. This system innovatively switches the connection between a radio frequency coil and a Faraday shielding device using a switch that controls radio frequency power. The system allows for effective plasma treatment processes and cleaning of dielectric windows and the inner walls of plasma treatment cavities.

Career Highlights

Kaidong Xu has worked with notable companies such as Jiangsu Leuven Instruments Co. Ltd and Imec Vzw. His experience in these organizations has contributed to his expertise in semiconductor technologies and innovations.

Collaborations

Throughout his career, Xu has collaborated with talented individuals, including Dongdong Hu and Na Li. These partnerships have fostered a creative environment that has led to significant advancements in their respective fields.

Conclusion

Kaidong Xu's innovative work in semiconductor technology and his numerous patents highlight his role as a leading inventor in the industry. His contributions continue to influence advancements in semiconductor manufacturing processes.