The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 22, 2023
Filed:
Feb. 26, 2020
Jiangsu Leuven Instruments Co., Ltd, Jiangsu, CN;
Haiyang Liu, Jiangsu, CN;
Dongdong Hu, Jiangsu, CN;
Xiaobo Liu, Jiangsu, CN;
Na Li, Jiangsu, CN;
Shiran Cheng, Jiangsu, CN;
Song Guo, Jiangsu, CN;
Zhihao Wu, Jiangsu, CN;
Kaidong Xu, Jiangsu, CN;
JIANGSU LEUVEN INSTRUMENTS CO., LTD, Jiangsu, CN;
Abstract
Provided are a faraday cleaning device and a plasma processing system, the device comprising a reaction chamber, a bias electrode, a wafer, a chamber cover, a coupling window, an air inlet nozzle, a vertical coil, and a faraday layer, wherein the coupling window is installed at the upper end face of the chamber cover, the chamber cover is installed at the upper end face of the reaction chamber, the bias electrode is assembled inside the reaction chamber, the wafer is installed at the upper end face of the bias electrode, the air inlet nozzle is assembled inside the coupling window, the faraday layer is installed at the upper end face of the coupling window, and the vertical coil is assembled at the upper end face of the faraday layer.