Company Filing History:
Years Active: 2015-2018
Title: Innovations of Kai-Yuan Pai in Poly-Crystalline Silicon Fabrication
Introduction
Kai-Yuan Pai is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of silicon fabrication, particularly in the development of poly-crystalline silicon ingots. With a total of 5 patents to his name, his work has had a substantial impact on the semiconductor industry.
Latest Patents
One of his latest patents involves methods of fabricating a poly-crystalline silicon ingot from a nucleation promotion layer comprised of chips and chunks of silicon-containing particles. This innovative method includes several steps: loading a nucleation promotion layer onto the bottom of a mold, providing a silicon source on the nucleation promotion layer, and heating the mold until the silicon source melts completely. The process also involves controlling thermal parameters to enable silicon grains to grow vertically, resulting in a poly-crystalline silicon ingot with specific characteristics. Another notable patent describes a poly-crystalline silicon ingot that features a nucleation promotion layer made up of chips and chunks of poly-crystalline silicon, which helps achieve a defect density of less than 15% at certain heights.
Career Highlights
Kai-Yuan Pai is currently employed at Sino-American Silicon Products Inc., where he continues to innovate in the field of silicon technology. His work has been instrumental in advancing the methods used in silicon ingot production, which is crucial for various applications in electronics and solar energy.
Collaborations
Throughout his career, Kai-Yuan has collaborated with notable colleagues such as Wen-Huai Yu and Yu-Min Yang. These partnerships have fostered a collaborative environment that enhances innovation and research in silicon fabrication.
Conclusion
Kai-Yuan Pai's contributions to the field of poly-crystalline silicon fabrication are noteworthy and continue to influence the industry. His innovative methods and collaborative efforts exemplify the spirit of advancement in technology.