The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 02, 2018
Filed:
Nov. 14, 2016
Sino-american Silicon Products Inc., Hsinchu, TW;
Wen-Huai Yu, Hsinchu, TW;
Cheng-Jui Yang, Hsinchu, TW;
Yu-Min Yang, Hsinchu, TW;
Kai-Yuan Pai, Hsinchu, TW;
Wen-Chieh Lan, Hsinchu, TW;
Chan-Lu Su, Hsinchu, TW;
Yu-Tsung Chiang, Hsinchu, TW;
Sung-Lin Hsu, Hsinchu, TW;
Wen-Ching Hsu, Hsinchu, TW;
Chung-Wen Lan, Hsinchu, TW;
Sino-American Silicon Products Inc., Hsinchu, TW;
Abstract
A method of fabricating a poly-crystalline silicon ingot includes: (a) loading a nucleation promotion layer onto a bottom of a mold; (b) providing a silicon source on the nucleation promotion layer in the mold; (c) heating the mold until the silicon source is melted into a silicon melt completely; (d) controlling at least one thermal control parameter regarding the silicon melt continually to enable the silicon melt to nucleate on the nucleation promotion layer such that a plurality of silicon grains grow in the vertical direction; (e) controlling the at least one thermal control parameter to enable the plurality of the silicon grains to continuously grow with an average grain size increasing progressively in the vertical direction until entirety of the silicon melt is solidified to obtain the poly-crystalline silicon ingot, wherein the nucleation promotion layer is loaded by spreading a plurality of mono-Si particles over the bottom of the mold.