Kai-Hung Yu

Title: Innovations by Kai-Hung Yu: Pioneering Advances in Semiconductor Technologies

Introduction

Kai-Hung Yu, based in Albany, NY, is a notable inventor with an impressive portfolio, holding 25 patents. His expertise lies in the realm of semiconductor technologies, where he has made significant contributions to methods that enhance manufacturing processes and material efficiency.

Latest Patents

Among his latest inventions, one notable patent is the "Method for filling recessed features in semiconductor devices with a low-resistivity metal." This innovative method involves providing a patterned substrate with a recessed feature and a dual layer exposed within it. By forming a nucleation enhancement layer on the sidewall of the first layer and depositing a metal layer through vapor phase deposition, this process significantly improves the fill quality of recessed features.

Another crucial patent is the "Method for using ultra thin ruthenium metal hard mask for etching profile control." This invention describes a process involving a multi-layer metal hard mask, with a lower layer made from ruthenium. The ruthenium layer may be deposited using atomic layer deposition and acts as a protective mask during the etching of underlying layers, allowing for greater precision in microelectronic workpieces.

Career Highlights

Kai-Hung Yu works at Tokyo Electron Limited, a leading company in the semiconductor manufacturing industry. His role involves driving innovations that enhance production processes and contribute to technological advancements within the sector.

Collaborations

Throughout his career, Yu has collaborated with esteemed colleagues such as Gerrit J. Leusink and Robert Daniel Clark. These partnerships have led to the development of groundbreaking technologies and methodologies that push the boundaries of semiconductor manufacturing.

Conclusion

Kai-Hung Yu's contributions to the field of semiconductor technology not only reflect his ingenuity as an inventor but also illustrate the importance of collaboration in driving innovation. His work continues to influence the industry, ensuring that technological advancements keep pace with the growing demands of the market.