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For the Inventor, By the Inventor

Hsinchu, Taiwan

Jyun-Ming Lin

USPTO Granted Patents = 15

Average Co-Inventor Count = 4.9

ph-index = 4

Forward Citations = 52(Granted Patents)


Company Filing History:

goldMedal15 out of 40,635 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents

Years Active: 2014-2025

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15 patents (USPTO):Explore Patents
1. 12464751 - Contact plugs and methods forming same (2025-11-04),
2. 11862708 - Contact plugs and methods forming same (2024-01-02),
3. 10930752 - Contact plugs and methods forming same (2021-02-23),
4. 10879127 - Gate structures for semiconductor devices (2020-12-29),
5. 10522412 - Gate structures with various widths and method for forming the same (2019-12-31),
6. 10516030 - Contact plugs and methods forming same (2019-12-24),
7. 10304942 - Sidewall spacers for self-aligned contacts (2019-05-28),
8. 9899265 - Gate structures with various widths and method for forming the same (2018-02-20),
9. 9882023 - Sidewall spacers for self-aligned contacts (2018-01-30),
10. 9711415 - Device for high-K and metal gate stacks (2017-07-18),
11. 9524965 - Gate structures with various widths and method for forming the same (2016-12-20),
12. 9472636 - Cost-effective gate replacement process (2016-10-18),
13. 9209089 - Method of fabricating a metal gate semiconductor device (2015-12-08),
14. 9076672 - Cost-effective gate replacement process (2015-07-07),
15. 8753931 - Cost-effective gate replacement process (2014-06-17),

Title: Jyun-Ming Lin: Pioneering Innovation in Semiconductor Technology

Introduction:

In the bustling tech hub of Hsinchu, Taiwan, inventor Jyun-Ming Lin stands out as a visionary in the world of semiconductor technology. With a trail of 14 patents behind him, Lin's relentless pursuit of excellence continues to inspire the next generation of inventors worldwide.

Latest Patents:

Among his latest patents is a groundbreaking method for forming contact plugs in transistors. This innovative process involves intricate steps like forming a low-k gate spacer, creating a metal gate, and precisely crafting a replacement gate dielectric. These cutting-edge techniques showcase Lin's commitment to pushing the boundaries of semiconductor manufacturing.

Career Highlights:

Jyun-Ming Lin is a key figure at Taiwan Semiconductor Manufacturing Company Ltd., a global leader in semiconductor fabrication. His expertise and innovative spirit have contributed significantly to the company's reputation for technological advancement and excellence in the industry.

Collaborations:

Collaborating closely with talented peers like Hua Feng Chen and Kuo-Hua Pan, Lin has been able to harness the power of teamwork to drive innovation forward. Together, they have worked on projects that have redefined the possibilities in semiconductor design and manufacturing.

Conclusion:

Inventor Jyun-Ming Lin's passion for innovation and his remarkable contributions to semiconductor technology have left an indelible mark on the industry. His dedication to pushing the boundaries of what is possible serves as an inspiration to inventors and technologists worldwide, shaping the future of technology for generations to come.

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