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For the Inventor, By the Inventor

Saitama, Japan

Junichi Suzuki

USPTO Granted Patents = 12

Average Co-Inventor Count = 3.7

ph-index = 6

Forward Citations = 75(Granted Patents)


Location History:

  • Shizuoka, JP (2009 - 2013)
  • Saitama, JP (2009 - 2013)

Company Filing History:

goldMedal12 out of 716 
 
Nuflare Technology, Inc.
 patents

Years Active: 2009-2013

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12 patents (USPTO):Explore Patents
1. 8527913 - Method for resizing pattern to be written by lithography technique, and charged particle beam writing method (2013-09-03),
2. 8429575 - Method for resizing pattern to be written by lithography technique, and charged particle beam writing method (2013-04-23),
3. 8352889 - Beam dose computing method and writing method and record carrier body and writing apparatus (2013-01-08),
4. 8103980 - Beam dose computing method and writing method and record carrier body and writing apparatus (2012-01-24),
5. 8065635 - Method for resizing pattern to be written by lithography technique, and charged particle beam writing method (2011-11-22),
6. 7740991 - Beam dose computing method and writing method and record carrier body and writing apparatus for determining an optimal dose of a charged particle beam (2010-06-22),
7. 7705327 - Beam shot position correction coefficient computation/updating technique for ultrafine pattern fabrication using variable shaped beam lithography (2010-04-27),
8. 7669174 - Pattern generation method and charged particle beam writing apparatus (2010-02-23),
9. 7619230 - Charged particle beam writing method and apparatus and readable storage medium (2009-11-17),
10. 7608845 - Charged particle beam writing apparatus and method thereof, and method for resizing dimension variation due to loading effect (2009-10-27),
11. 7525110 - Multiple irradiation effect-corrected dose determination technique for charged particle beam lithography (2009-04-28),
12. 7511290 - Charged particle beam writing method and apparatus (2009-03-31),

Title: Junichi Suzuki: Innovator in Lithography Techniques

Introduction

Junichi Suzuki is a prominent inventor based in Saitama, Japan. He has made significant contributions to the field of lithography, particularly in methods that enhance the precision of pattern resizing. With a total of 12 patents to his name, Suzuki's work is influential in advancing technology in this area.

Latest Patents

Among his latest patents is a method for resizing patterns to be written by lithography techniques. This innovative approach involves calculating a first dimension correction amount for a pattern to correct dimension errors caused by loading effects. The method includes virtually dividing a writing region of a target workpiece into small regions, calculating a second dimension correction amount based on the line width dimension of the pattern, and resizing the line width dimension using the corrected first dimension correction amount. This process ultimately outputs a result of the resizing, showcasing Suzuki's expertise in enhancing lithographic techniques.

Career Highlights

Junichi Suzuki is currently associated with Nuflare Technology, Inc., where he continues to develop cutting-edge technologies in lithography. His work has not only contributed to the company's success but has also positioned him as a key figure in the field of semiconductor manufacturing.

Collaborations

Throughout his career, Suzuki has collaborated with notable colleagues, including Takayuki Abe and Keiko Emi. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Junichi Suzuki's contributions to lithography and pattern resizing methods have made a significant impact on the industry. His innovative approaches and collaborations continue to drive advancements in technology.

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