The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 31, 2009
Filed:
Feb. 06, 2007
Junichi Suzuki, Saitama, JP;
Keiko Emi, Ibaraki, JP;
Takayuki Abe, Kanagawa, JP;
Tomohiro Iijima, Shizuoka, JP;
Junichi Suzuki, Saitama, JP;
Keiko Emi, Ibaraki, JP;
Takayuki Abe, Kanagawa, JP;
Tomohiro Iijima, Shizuoka, JP;
NuFlare Technology, Inc., Numazu-shi, JP;
Abstract
A method for writing a pattern on a workpiece by use of a charged particle beam, the method includes calculating a corrected dose including at least a proximity effect correction dose for correction of proximity effect, calculating a corrected residual difference-corrected dose for correcting a correction residual difference of the corrected dose, calculating a exposure dose of the charged particle beam to be corrected by the corrected dose as corrected by the correction residual difference-corrected dose, and irradiating the charged particle beam onto the workpiece in such a way as to become the exposure dose.