The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 2009
Filed:
Nov. 19, 2007
Takayuki Abe, Kanagawa, JP;
Junichi Suzuki, Saitama, JP;
Tomohiro Iijima, Shizuoka, JP;
Hideyuki Tsurumaki, Kanagawa, JP;
Takayuki Abe, Kanagawa, JP;
Junichi Suzuki, Saitama, JP;
Tomohiro Iijima, Shizuoka, JP;
Hideyuki Tsurumaki, Kanagawa, JP;
NuFlare Technology, Inc., Numazu-shi, JP;
Abstract
A charged particle beam writing apparatus includes a first part configured, based on pattern data, to estimate a total writing time, a second part configured to acquire a base dose at an arbitrary time, after writing start time and within the total writing time by using a first correlation among a time having passed since the writing start time, the total writing time, and the base dose, a third part configured to acquire a fogging effect correction coefficient at the arbitrary time by using a second correlation among the time, the total writing time and the coefficient, a forth part configured to calculate a beam dose at the arbitrary time by using the base dose and the coefficient, a fifth part configured to calculate a beam irradiation time based on the beam dose, a deflector for deflecting the beam, and an aperture for blocking the beam.