Tokyo, Japan

Junichi Horikawa

USPTO Granted Patents = 23 

Average Co-Inventor Count = 4.3

ph-index = 7

Forward Citations = 474(Granted Patents)


Location History:

  • Yamanashi, JP (1997 - 1999)
  • Kofu, JP (2007 - 2011)
  • Singapore, SG (2011 - 2014)
  • Shinjuku-ku, JP (2016 - 2018)
  • Tokyo, JP (2001 - 2022)

Company Filing History:


Years Active: 1997-2022

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23 patents (USPTO):Explore Patents

Title: Innovations in Semiconductor Technology: The Contributions of Junichi Horikawa

Introduction: Junichi Horikawa, an influential inventor based in Tokyo, Japan, has made significant advancements in the field of semiconductor technology. With a remarkable portfolio of 23 patents, his work has focused primarily on enhancing the efficiency and accuracy of semiconductor manufacturing processes.

Latest Patents: Among his most recent contributions are inventions related to reflective mask technology. His patents include the reflective mask blank and a reflective mask designed to mitigate the shadowing effects often encountered in extreme ultraviolet (EUV) lithography. This innovative technology allows for the creation of fine patterns essential for the stable and precise manufacture of semiconductor devices. The reflective mask blank is constructed with a multilayer reflective film and an absorber film that includes materials with amorphous metals such as cobalt and nickel. His other notable patent involves a mask blank substrate tailored for lithography, which meets specific relational equations and surface roughness criteria, ensuring high-quality pattern transfers.

Career Highlights: Horikawa has built his career at notable companies, including Hoya Corporation and Wd Media (Singapore) Pte. Ltd., where he has been pivotal in driving research and product development. His expertise in semiconductor manufacturing processes has established him as a leading figure in this technical domain.

Collaborations: Throughout his career, Junichi Horikawa has collaborated with esteemed colleagues, including Toshihiko Orihara and Kazuhiro Hamamoto. These partnerships have fostered an environment of innovation and have contributed to the advancement of their collective research efforts.

Conclusion: Junichi Horikawa's inventive spirit and commitment to advancing semiconductor technology are evident through his numerous patents and professional endeavors. His contributions enhance manufacturing processes, pushing the boundaries of what is possible in high-precision semiconductor fabrication. As the industry continues to evolve, Horikawa's work remains at the forefront, shaping the future of technology.

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