Andover, MA, United States of America

Jun Seok Lee

USPTO Granted Patents = 9 

Average Co-Inventor Count = 4.6

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2016-2024

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9 patents (USPTO):Explore Patents

Title: The Innovator Jun Seok Lee: A Pioneer in Plasma Treatment Technologies

Introduction

Jun Seok Lee is an accomplished inventor based in Andover, MA, with a remarkable portfolio of 9 patents to his name. His innovative contributions primarily focus on enhancing microelectronic devices and improving the processing of implanted workpieces. His work has significantly advanced the field of semiconductor technology.

Latest Patents

Among Jun Seok Lee’s notable patents is a groundbreaking method titled "Plasma treatment process to densify oxide layers." This patent outlines a sophisticated approach to gap fill deposition and film densification on microelectronic devices. It details the process of forming a silicon oxide-containing layer and applying a series of plasma treatments to achieve a densified oxide layer, ultimately enhancing device performance.

Another significant patent of his is centered around "Phosphorus fugitive emission control." This method addresses the critical issue of reducing fugitive emissions from implanted workpieces. It explores innovative techniques such as sputtering and chemical etching to mitigate the surface concentration of toxic dopants, ensuring safer processing conditions while maintaining high-quality semiconductor devices.

Career Highlights

Jun Seok Lee has garnered experience at prominent companies in the semiconductor industry, including Applied Materials, Inc. and Varian Semiconductor Equipment Associates, Inc. His roles at these organizations provided him with the platform to develop and refine his innovative technologies, contributing to substantial advancements in semiconductor manufacturing processes.

Collaborations

Throughout his career, Jun has collaborated with esteemed colleagues like Timothy J. Miller and Deven Raj Mittal. Their combined expertise has fostered a rich environment for idea exchange and innovation, further propelling advancements in their shared field.

Conclusion

Jun Seok Lee’s inventive spirit and dedication to advancing semiconductor technology have made a lasting impact in the industry. His published patents not only reflect his commitment to innovation but also position him as a leading figure in the development of next-generation microelectronic devices. As technology continues to evolve, the contributions of inventors like Jun Seok Lee will undoubtedly shape the future landscape of the semiconductor industry.

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