Gyeonggi-do, South Korea

Jum-Yong Park


Average Co-Inventor Count = 2.6

ph-index = 3

Forward Citations = 21(Granted Patents)


Location History:

  • Ichon-shi, KR (2011)
  • Ichon, KR (2011)
  • Icheon-si, KR (2014)
  • Gyeonggi-do, KR (2012 - 2015)

Company Filing History:


Years Active: 2011-2015

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7 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Jum-Yong Park

Introduction

Jum-Yong Park is a prominent inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of seven patents. His work has advanced the methods used in fabricating semiconductor devices, showcasing his expertise and innovative spirit.

Latest Patents

Among his latest patents is a semiconductor device with a buried gate and a method for fabricating the same. This method involves forming landing plugs over a substrate, etching a trench between the landing plugs, and creating a buried gate that partially fills the trench. Additionally, he has developed a method for fabricating buried gates using pre-landing plugs, which includes forming a plug conductive layer, etching it to create landing plugs, and forming a gate insulation layer over the trench surface.

Career Highlights

Jum-Yong Park has worked with notable companies in the semiconductor industry, including Hynix Semiconductor Inc. and SK Hynix Inc. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in semiconductor technology.

Collaborations

Throughout his career, Jum-Yong Park has collaborated with talented individuals such as Jong-Han Shin and Cheol-Hwi Ryu. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Jum-Yong Park's contributions to semiconductor technology through his patents and collaborations highlight his role as a leading inventor in the field. His innovative methods continue to influence the industry and pave the way for future advancements.

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