Joyeeta Nag

Title: Joyeeta Nag: Innovator in Self-Aligned Via Interconnect Structures

Introduction

Joyeeta Nag is an accomplished inventor based in Wappingers Falls, NY, known for his significant contributions to the field of semiconductor technology. With a remarkable portfolio comprising 18 patents, his work reflects a deep commitment to innovation in manufacturing techniques and circuit design.

Latest Patents

One of Joyeeta Nag's latest patents focuses on "Self-Aligned Via Interconnect Structures." This invention encompasses methods for manufacturing self-aligned via interconnect structures, which are crucial for enhancing the efficiency of wiring structures embedded in dielectric materials. The method involves several steps: forming a wiring structure, applying a cap layer over the surface, creating an opening to expose the wiring structure, and selectively growing a metal or metal-alloy via interconnect structure material. This groundbreaking approach culminates in the formation of an upper wiring structure that maintains electrical contact with the newly developed interconnect materials.

Career Highlights

Throughout his career, Nag has had the privilege of working with prestigious firms including International Business Machines Corporation (IBM) and Globalfoundries Inc., where he has honed his skills and contributed to cutting-edge technological advancements. His roles in these organizations have enabled him to be at the forefront of innovation in semiconductor manufacturing processes.

Collaborations

Joyeeta Nag has collaborated with several notable professionals in his field, including Vincent James McGahay and Yiheng Xu. These collaborations highlight the importance of teamwork in driving innovation and advancing technologies in complex manufacturing environments.

Conclusion

Joyeeta Nag's achievements in the realm of self-aligned via interconnect structures underscore his status as a leading inventor in semiconductor technology. With a steadfast focus on innovation, his work continues to influence the future of circuit design and manufacturing processes. His contributions not only enhance the capabilities of semiconductor devices but also pave the way for future advancements in the industry.