Company Filing History:
Years Active: 2014-2025
Title: Joseph Lindsey Womack: Innovator in Plasma-Enhanced Deposition Technologies
Introduction
Joseph Lindsey Womack is a notable inventor based in Tigard, Oregon. He has made significant contributions to the field of plasma-enhanced deposition technologies, holding a total of 6 patents. His work focuses on methods and apparatuses for depositing film stacks with varying compositions, which are crucial in various industrial applications.
Latest Patents
Womack's latest patents include innovative methods for plasma-enhanced deposition. One of his patents describes a method for depositing a film stack that includes films of different compositions in a process station using plasma. This method involves a first plasma-activated film deposition phase, where a first film with a specific composition is deposited on a substrate. In the subsequent phase, a second film with a different composition is deposited on the first film. The process allows for the delivery of multiple reactants through a single delivery line, enhancing efficiency.
Another significant patent is for a PECVD apparatus designed for in-situ deposition of film stacks. This apparatus enables the deposition of multiple film layers with different compositions without exposing the substrate to a vacuum break between phases. It includes a process chamber, a plasma source, and a reactant feed system that allows for the sequential introduction of reactant gas mixtures.
Career Highlights
Throughout his career, Womack has worked with prominent companies in the semiconductor industry, including Novellus Systems Incorporated and Lam Research Corporation. His experience in these organizations has contributed to his expertise in plasma-enhanced deposition technologies.
Collaborations
Womack has collaborated with notable professionals in his field, including Keith Fox and Dong Niu. These collaborations have likely enriched his work and led to advancements in the technologies he has developed.
Conclusion
Joseph Lindsey Womack is a distinguished inventor whose work in plasma-enhanced deposition technologies has made a significant impact in the industry. His innovative patents and career achievements reflect his dedication to advancing the field.
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