Average Co-Inventor Count = 4.5

ph-index = 18

Forward Citations = 1,129(Granted Patents)

Company Filing History:

Olympus Optical Company, Ltd.

patents

2 out of 1,530

Mitsubishi Materials Corporation

patents

4. 2 out of 655

Matsushita Electronics Corporation

Matsushita Electric Industrial Co., Ltd.

patents

7. 14 out of 832,680

Other

patents

where one patent can have more than one assignee

Years Active: 1995-2005

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43 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 6867452 - Interlayer oxide containing thin films for high dielectric constant application of the formula AB2O6 or AB2O7 (2005-03-15),

2. 6686489 - Metal organic precursors for transparent metal oxide thin films and method of making same (2004-02-03),

3. 6570202 - Ferroelectric integrated circuit having low sensitivity to hydrogen exposure and method for fabricating same (2003-05-27),

4. 6559469 - Ferroelectric and high dielectric constant transistors (2003-05-06),

5. 6541279 - Method for forming an integrated circuit (2003-04-01),

6. 6512256 - Integrated circuit having self-aligned hydrogen barrier layer and method for fabricating same (2003-01-28),

7. 6495878 - Interlayer oxide containing thin films for high dielectric constant application (2002-12-17),

8. 6447838 - Integrated circuit capacitors with barrier layer and process for making the same (2002-09-10),

9. 6441414 - Ferroelectric field effect transistor, memory utilizing same, and method of operating same (2002-08-27),

10. 6376691 - Metal organic precursors for transparent metal oxide thin films and method of making same (2002-04-23),

11. 6372286 - Barium strontium titanate integrated circuit capacitors and process for making the same (2002-04-16),

12. 6365927 - Ferroelectric integrated circuit having hydrogen barrier layer (2002-04-02),

13. 6358758 - Low imprint ferroelectric material for long retention memory and method of making the same (2002-03-19),

14. 6339238 - Ferroelectric field effect transistor, memory utilizing same, and method of operating same (2002-01-15),

15. 6285048 - Barium strontium titanate integrated circuit capacitors and process for making the same (2001-09-04),

Title: **Joseph D Cuchiaro: Innovator in High Dielectric Materials**

Introduction

Joseph D Cuchiaro, based in Colorado Springs, CO, is a prolific inventor with an impressive portfolio of 43 patents. His work primarily focuses on innovations in materials science, particularly in the realm of high dielectric constant applications. Cuchiaro's contributions have significant implications for various technological advancements and industrial applications.

Latest Patents

Cuchiaro's latest patents include groundbreaking developments in thin films for high dielectric constant applications. One notable patent details an interlayer oxide containing thin films that utilize metal oxides selected from tungsten-bronze-type oxides and pyrochlore-type oxides. These films are characterized by their high relative dielectric constant of 40 or more, with some embodiments achieving around 100. His research also introduces metal organic precursors for creating transparent metal oxide thin films, aimed at optimizing conductivity and shelf life for diverse applications.

Career Highlights

Throughout his career, Joseph D Cuchiaro has made substantial contributions to the field of materials science. His work at companies such as Symetrix Corporation has been pivotal in developing innovative solutions that enhance the functionality of electronic materials. His intellectual property reflects his commitment to advancing technology through effective and efficient materials design.

Collaborations

During his professional journey, Cuchiaro has collaborated with notable peers, including Carlos Alberto Paz de Araujo and Larry D McMillan. These collaborations have fostered a dynamic exchange of ideas, contributing to the evolution of technologies in which Cuchiaro has played an integral role.

Conclusion

Joseph D Cuchiaro stands as a prominent figure in the field of materials science, with a rich legacy of innovation exemplified by his numerous patents. His work not only underscores the importance of research and development in high dielectric materials but also illustrates the potential for future advancements in electronics and beyond.

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