Yongin-si, South Korea

Joo-Byoung Yoon



Average Co-Inventor Count = 5.8

ph-index = 1

Forward Citations = 2(Granted Patents)


Location History:

  • Gyeonggi-do, KR (2010)
  • Yongin-si, KR (2008 - 2016)

Company Filing History:


Years Active: 2008-2016

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5 patents (USPTO):Explore Patents

Title: Joo-Byoung Yoon: Innovator in Semiconductor Fabrication

Introduction

Joo-Byoung Yoon is a prominent inventor based in Yongin-si, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of five patents. His work focuses on methods and apparatuses that enhance the fabrication of semiconductor devices.

Latest Patents

Among his latest patents, Joo-Byoung Yoon has developed methods for fabricating gate insulating layers in gate trenches. This method involves forming a field region that defines an active region in a substrate, followed by the creation of a gate trench. The process includes forming a gate insulating layer on the active region's surface and a gate barrier layer that includes metal. Additionally, he has patented a semiconductor fabrication apparatus that performs etching and deposition processes on semiconductor substrates. This apparatus features a unique design with lower, middle, and upper electrodes, allowing for efficient semiconductor processing.

Career Highlights

Joo-Byoung Yoon is currently employed at Samsung Electronics Co., Ltd., a leading company in the technology sector. His innovative approaches to semiconductor fabrication have positioned him as a key figure in the industry. His patents reflect a deep understanding of the complexities involved in semiconductor manufacturing.

Collaborations

Some of his notable coworkers include Kyung-Woo Lee and Yeong-Cheol Lee. Their collaborative efforts contribute to the advancement of semiconductor technologies.

Conclusion

Joo-Byoung Yoon's contributions to semiconductor fabrication are noteworthy, showcasing his expertise and innovative spirit. His patents not only enhance the manufacturing processes but also pave the way for future advancements in the field.

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