Jong-Su Kim

Title: Jong-Su Kim: Innovator in Photomask Design and Semiconductor Fabrication

Introduction

Jong-Su Kim is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the fields of photomask design and semiconductor fabrication. With a total of 7 patents to his name, Kim's work has had a substantial impact on the technology industry.

Latest Patents

Among his latest patents, Kim has developed a method of designing a layout of a photomask and a method of manufacturing a photomask. This innovative method includes obtaining a design layout of a mask pattern, performing optical proximity correction on the design layout to obtain design data, and correcting position data of the pattern based on position error data. Additionally, he has patented a method of fabricating semiconductor devices that involves forming conductive gate patterns and mirror patterns on a substrate, ensuring that the overlay mark area remains free of gate patterns.

Career Highlights

Throughout his career, Jong-Su Kim has worked with leading companies in the technology sector, including Samsung Electronics Co., Ltd. and Halla Climate Control Corporation. His expertise in photomask design and semiconductor technology has positioned him as a key figure in these organizations.

Collaborations

Kim has collaborated with notable colleagues in his field, including Yong-Kug Bae and Dong-Woon Park. These partnerships have further enhanced his innovative contributions to technology.

Conclusion

Jong-Su Kim's work in photomask design and semiconductor fabrication showcases his dedication to innovation and excellence. His patents reflect a deep understanding of complex technological processes, making him a valuable asset to the industry.