The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 07, 2017
Filed:
Jun. 16, 2016
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-Do, KR;
Jong-Su Kim, Seoul, KR;
SAMSUNG ELECTRONICS CO., LTD., Suwon-si, Gyeonggi-Do, KR;
Abstract
The disclosure relates to methods of fabricating semiconductor devices. A method of fabricating a semiconductor device is provided as follows. A target layer is formed. A hard mask layer is formed on the target layer. The hard mask layer is patterned to form an overlay mask pattern including a first mask pattern and a plateau-shaped mask pattern. The first mask pattern encloses the plateau-shaped mask pattern. The first mask pattern is spaced apart from the plateau-shaped mask pattern. The target layer is patterned using the overlay mask pattern to form a redundant fin and a plateau-shaped overlay mark. The redundant fin is removed.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile