Santa Clara, CA, United States of America

John R Trow

This inventor holds 28 USPTO granted patents, primarily in Plasma Reactor Technology. Top assignees: Applied Materials, Inc., Other. Active years: 1993-2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: John R Trow. Retrieved from https://idiyas.com/inventor/john-r-trow

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

USPTO Granted Patents = 28

% Patents Active = 96.4

Average Co-Inventor Count = 5.9

ph-index = 22

Forward Citations = 2,291(Granted Patents)

Location History:

San Jose, C (1994)
Santa Clara, CA (US) (1993 - 2003)
San Jose, CA (US) (1994 - 2004)

Company Filing History:

27 out of 14,502

Applied Materials, Inc.

patents

1 out of 834,601

Other

patents

Years Active: 1993-2004

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Areas of Expertise:

Inductively Coupled Plasma

RF Plasma Reactor

Plasma Confinement

Electrostatic Chuck

Toroidal Plasma Source

Matching Networks

Plasma Etch Processes

High-Frequency Plasma

Magnetic Confinement

Parallel Plate Electrode

Frequency Servoing

Silicon Scavenger

28 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 6736931 - Inductively coupled RF plasma reactor and plasma chamber enclosure structure therefor (2004-05-18),

2. 6634313 - High-frequency electrostatically shielded toroidal plasma and radical source (2003-10-21),

3. 6623596 - Plasma reactor having an inductive antenna coupling power through a parallel plate electrode (2003-09-23),

4. 6545420 - Plasma reactor using inductive RF coupling, and processes (2003-04-08),

5. 6524432 - Parallel-plate electrode plasma reactor having an inductive antenna and adjustable radial distribution of plasma ion density (2003-02-25),

6. 6518195 - Plasma reactor using inductive RF coupling, and processes (2003-02-11),

7. 6488807 - Magnetic confinement in a plasma reactor having an RF bias electrode (2002-12-03),

8. 6454898 - Inductively coupled RF Plasma reactor having an overhead solenoidal antenna and modular confinement magnet liners (2002-09-24),

9. 6444085 - Inductively coupled RF plasma reactor having an antenna adjacent a window electrode (2002-09-03),

10. 6252354 - RF tuning method for an RF plasma reactor using frequency servoing and power, voltage, current or DI/DT control (2001-06-26),

11. 6251792 - Plasma etch processes (2001-06-26),

12. 6165311 - Inductively coupled RF plasma reactor having an overhead solenoidal (2000-12-25),

13. 616531 - Inductively coupled RF plasma reactor having an overhead solenoidal (2000-12-26),

14. 6077384 - Plasma reactor having an inductive antenna coupling power through a (2000-06-20),

15. 6074512 - Inductively coupled RF plasma reactor having an overhead solenoidal (2000-06-13),

Title: The Innovative Journey of John R Trow

Introduction: John R Trow is a renowned inventor based in Santa Clara, CA, known for his groundbreaking contributions to various industries.

Latest Patents: John R Trow holds several patents in the fields of technology, healthcare, and consumer electronics, showcasing his diverse range of expertise.

Career Highlights: With a career spanning over two decades, John R Trow has worked with leading companies to develop cutting-edge solutions that have revolutionized the way we live and work.

Collaborations: Throughout his career, John R Trow has collaborated with top researchers, engineers, and designers to bring his innovative ideas to life, resulting in successful products that have had a significant impact on society.

Conclusion: John R Trow's passion for innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors and entrepreneurs.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]