The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 20, 2000
Filed:
Feb. 02, 1996
Kenneth S Collins, San Jose, CA (US);
Michael Rice, Pleasanton, CA (US);
John Trow, San Jose, CA (US);
Douglas Buchberger, Tracy, CA (US);
Eric Askarinam, Sunnyvale, CA (US);
Joshua Chiu-Wing Tsui, Santa Clara, CA (US);
David W Groechel, Los Altos Hills, CA (US);
Raymond Hung, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
The invention is embodied by a plasma reactor for processing a workpiece, including a reactor enclosure defining a processing chamber, a semiconductor window, a base within the chamber for supporting the workpiece during processing thereof, a gas inlet system for admitting a plasma precursor gas into the chamber, and an inductive antenna adjacent a side of the semiconductor window opposite the base for coupling power into the interior of the chamber through the semiconductor window electrode.